Dynamic Ebeam System
Designed to use a sealed emitter allowing for installation in a wide variety of shielded configurations
These nnovative system designs leverage sealed-emitter technology to deliver the benefits of ebeam to R&D lines, narrow web, or 3D part processing applications.
The Dynamic series connects a full range of ebeam capabilities with creative configuration concepts.
Technical Specifications | Values |
---|---|
Accelerating Voltage | 80 to 300 kV |
Maximum Uniform Beam Width | 360 mm |
Maximum Production Speed [Model and Voltage Dependent] |
100 m/min |
Maximum Surface Dose Rate for 80 kV | 30 kGy @ 100 m/min |
Cross-web Uniformity | ≤ ±10.0% variation |
Nitrogen Inerting Level | ≤ 200 ppm O2 |
Product Clearance | Various |
Product Support | Patented integrated shield roll, beam absorber, or other |
Typical Dimensions (H x W x D) | 48 x 122 x 66 cm |
Facility Requirements | Electricity, cooling water, and nitrogen |
Noise Level | < 70.0 dB(A) |
Download the Ebeam Dynamic Series brochure HERE