Dynamic Ebeam System
Designed to use a sealed emitter allowing for installation in a wide variety of shielded configurations
These nnovative system designs leverage sealed-emitter technology to deliver the benefits of ebeam to R&D lines, narrow web, or 3D part processing applications.
The Dynamic series connects a full range of ebeam capabilities with creative configuration concepts.
| Technical Specifications | Values |
|---|---|
| Accelerating Voltage | 80 to 300 kV |
| Maximum Uniform Beam Width | 360 mm |
| Maximum Production Speed [Model and Voltage Dependent] |
100 m/min |
| Maximum Surface Dose Rate for 80 kV | 30 kGy @ 100 m/min |
| Cross-web Uniformity | ≤ ±10.0% variation |
| Nitrogen Inerting Level | ≤ 200 ppm O2 |
| Product Clearance | Various |
| Product Support | Patented integrated shield roll, beam absorber, or other |
| Typical Dimensions (H x W x D) | 48 x 122 x 66 cm |
| Facility Requirements | Electricity, cooling water, and nitrogen |
| Noise Level | < 70.0 dB(A) |
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