Dynamic Ebeam System
Designed to use a sealed emitter allowing for installation in a wide variety of shielded configurations
These nnovative system designs leverage sealed-emitter technology to deliver the benefits of ebeam to R&D lines, narrow web, or 3D part processing applications.
The Dynamic series connects a full range of ebeam capabilities with creative configuration concepts.
|Accelerating Voltage||80 to 300 kV|
|Maximum Uniform Beam Width||360 mm|
|Maximum Production Speed
[Model and Voltage Dependent]
|Maximum Surface Dose Rate for 80 kV||30 kGy @ 100 m/min|
|Cross-web Uniformity||≤ ±10.0% variation|
|Nitrogen Inerting Level||≤ 200 ppm O2|
|Product Support||Patented integrated shield roll, beam absorber, or other|
|Typical Dimensions (H x W x D)||48 x 122 x 66 cm|
|Facility Requirements||Electricity, cooling water, and nitrogen|
|Noise Level||< 70.0 dB(A)|